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|Title:||Novel methods of fabrication and metrology of superconducting nanostructures|
|Keywords:||Magnetic field effects;Nanotechnology;Superconducting devices;Thin films|
|Citation:||IEEE Transactions on Instrumentation and Measurement, 56(2): 392 - 396, Apr 2007|
|Abstract:||As metrology extends toward the nanoscale, a number of potential applications and new challenges arise. By combining photolithography with focused ion beam and/or electron beam methods, superconducting quantum interference devices (SQUIDs) with loop dimensions down to 200 nm and superconducting bridge dimensions of the order 80 nm have been produced. These SQUIDs have a range of potential applications. As an illustration, we describe a method for characterizing the effective area and the magnetic penetration depth of a structured superconducting thin film in the extreme limit, where the superconducting penetration depth $lambda$ is much greater than the film thickness and is comparable with the lateral dimensions of the device.|
|Appears in Collections:||Dept of Mechanical Aerospace and Civil Engineering Research Papers|
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