Please use this identifier to cite or link to this item: http://buratest.brunel.ac.uk/handle/2438/12088
Title: Nanostructured silicon oxide film for enhanced crystalline solar cell
Authors: Tahhan, A
Dehouche, Z
Anson, T
Fern, G
Keywords: Monocrystalline solar cell;Nanoparticles;PECVD;Silicon oxide
Issue Date: 2014
Publisher: IEEE
Citation: 40th IEEE Photovoltaic Specialists Conference (PVSC), Denver, CO, pp. 1296 - 1298, 8-13 Jun 2014
Abstract: In this study, we investigate the potential use of silicon oxide layer as one possible way to increase the silicon solar efficiency at low cost. The layer is fabricated on top of commercially available monocrystalline silicon (mc-Si) solar cells by low temperature Plasma Enhanced Chemical Vapour Deposition (PECVD) using Tetramythyle-Silane (TMS), (C4H12Si) precursor and oxidized by means of potassium permanganate (KMn04) agent. This study compares the electrical and optical characteristics of monocrystalline silicon cells before and after coating. The PV cells surface chemical composition was analyzed using Scanning Electron Microscopy (SEM). Reflectance and transmittance analysis results are also presented. The experimental results show a relative enhancement of about 10% (from 12.14% to 13.34%) in the monocrystalline cell electrical efficiency conversion.
URI: http://bura.brunel.ac.uk/handle/2438/12088
ISBN: 978-1-4799-4398-2
ISSN: http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000366638901117&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=f12c8c83318cf2733e615e54d9ed7ad5
Appears in Collections:Dept of Mechanical Aerospace and Civil Engineering Research Papers

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